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X-ray diffraction equipment, intended for non-destructive characterisation of synthesised materials in order to determine the crystal structure and microstructural parameters. It will enable analysis of a wide range of materials (thin films, powders, liquid suspensions, membranes), being used for applications such as phase identification and analysis, Rietveld refinement, microstructural analysis, reflectivity measurements, reciprocal space mapping, and determination of residual stress. The equipment will be part of a prototyping line of the type "Microfabrication of semiconductor devices" within the PNTS Project – "National Platform of Semiconductor Technologies". The equipment must ensure high-resolution measurements, flexibility in configuring the experimental setup, and must be equipped with detection systems, analysis software and safe-operation mechanisms. X-ray diffraction equipment, intended for non-destructive characterisation of synthesised materials in order to determine the crystal structure and microstructural parameters. It will enable analysis of a wide range of materials (thin films, powders, liquid suspensions, membranes), being used for applications such as…

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