Reaktives Ionenätzen

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For the projects currently being carried out in the chair, the fabrication of suspended waveguides by means of “Faraday Cage Etching” is central. This complex process requires two completely different etching regimes in the same chamber. Accordingly, decoupled plasma density and ion energy are needed (for p-i-n diode integration). Further research projects require active helium backside cooling (for nanophotonic waveguides) to prevent “flowing” or burning of the electron-beam resist (E-beam resist). For additional projects as well as when post-processing FIB-implanted defects, preserving crystal quality is of top priority. High-energy ion bombardment would damage the lattice and destroy the optical coherence of the color centers. It is important to remove surface layers gently (“Soft Etch”) without introducing new defects deep into the crystal. Ultimately, for structuring Solid Immersion Lenses (SILs) in diamond, a pure oxygen plasma is required, whereas SiC requires fluorine chemistry (SF₆/CHF₃). Accordingly, a gas box with at least 5 lines for fluorine and oxygen processes is necessary so that both material classes can be processed without hardware modification. An “Open Load”…

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