Suministro, instalación y puesta en funcionamiento de un equipo Electron Beam Lithography tool up to 8-inch wafers (UPV04) y un equipo SEM (UPV13) para la Pilot Line de la UPV

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The contract subject to this procedure is necessary in order to carry out the research and development work for the UPV Pilot Line, with the aim of improving the existing advanced pilot lines and developing new ones throughout the Union, to enable the development and deployment of cutting-edge semiconductor technologies and next-generation semiconductor technologies. To this end, it is necessary to proceed with the acquisition, among others, of the following equipment: 4 • UPV04 - Electron beam lithography tool up to 8-inch wafers: Electron beam lithography equipment that exposes patterns in sensitive resists by means of a focused and scanned electron beam. It writes features with nanometric resolution according to the design in a digital file. Dedicated to nanofabrication patterning, especially for masks and structures in photonics, semiconductors, and nanotechnology. • UPV13 – SEM: Surface inspection equipment using a focused electron beam that delivers nanometric resolution images. It allows obtaining morphological information and surface contrast, as well as contrast associated with differences in composition or atomic number, depending on the detectors and imaging…

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